衬底温度对PLD制备的Mo薄膜结构及表面形貌的影响

 运用脉冲激光沉积(PLD)技术在Si(100)基片上沉积了金属Mo薄膜。在激光重复频率2 Hz，能量密度5.2 J/cm²，本底真空10^－6 Pa的条件下，研究Mo薄膜的结构和表面形貌，讨论了衬底温度对薄膜形貌与结构的影响。原子力显微镜(AFM)图像和X射线小角衍射(XRD)分析表明，薄膜表面平整、光滑，均方根粗糙度小于2 nm。沉积温度对Mo薄膜结构和表面形貌影响较大，在373~573 K范围内随着温度升高，薄膜粗糙度变小，结晶程度变好。

Effect of substrate temperature on structure and surface morphology of Mo films deposited by pulsed laser technique

Molybdenum thin films were fabricated on Si(100) substrates by pulsed laser deposition technique. The effect of substrate temperature on structure and surface morphology of the molybdenum films was investigated at 10^－6 Pa with laser pulses of 2 Hz repetition rate and 5.2 J/cm² power density. Results of atomic force microscopy(AFM) and X-ray diffraction (XRD) show that root mean square of the film surface roughness is below 2 nm, and indicate that the surface morphology and microstructures of the molybdenum films depend greatly on substrate temperature during growth. Structural quality and surface morphology of the molybdenum films are improved with the temperature increasing from 373 K to 573 K．