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The analysis of conductive solid samples by r.f. capacitively coupled plasma at atmospheric pressure
Authors:Sorin D Anghel  Tiberiu Frentiu  Ana-Maria Rusu  Lucia Bese and E A Cordos
Institution:(1) Chemistry Department and Research Center for Analytical Instrumentation, University of Cluj, 3400 Cluj-Napoca, Romania;(2) Physics Department, University of Cluj, 3400 Cluj-Napoca, Romania;(3) Silcotub Co., 4700 Zalau, Romania
Abstract:A radiofrequency capacitively coupled plasma (rf CCP) with tip-ring electrode geometry has been used for the analysis of Al, Co, Cr, Cu, Mn, Mo, Ni, and V in low and medium alloyed steel. The sample is used as one of the electrodes of the plasma torch. The influence of plasma power, argon flow rate and distance between the electrodes on the analytical signals has been studied. The limits of detection are in the range of 0.001 to 0.048%. The dynamic range is three orders of magnitude.
Keywords:
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