| Enhanced emission of the laser generated plume in Ar gas |
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| 引用本文： | Hongping Guo,Qihong Lou(Shanghai Institute of Optics and Fine Mechanics,Academia Sinica,P.O.Box 800-211,Shanghai 201800,China)S. C. Chen,N. H. Cheung,Z. Y. Wang(Department of Physics,Hong Kong Baptist College,224 Waterloo Road,Kowloon,Hong Kong). Enhanced emission of the laser generated plume in Ar gas[J]. Chinese Journal of Lasers, 1992, 0(6) |
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| 作者姓名： | Hongping Guo Qihong Lou(Shanghai Institute of Optics and Fine Mechanics Academia Sinica P.O.Box 800-211 Shanghai 201800 China)S. C. Chen N. H. Cheung Z. Y. Wang(Department of Physics Hong Kong Baptist College 224 Waterloo Road Kowloon Hong Kong) |
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| 作者单位： | Hongping Guo，Qihong Lou(Shanghai Institute of Optics and Fine Mechanics，Academia Sinica，P.O.Box 800-211，Shanghai 201800，China)S. C. Chen，N. H. Cheung，Z. Y. Wang(Department of Physics，Hong Kong Baptist College，224 Waterloo Road，Kowloon，Hong Kong) |
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| 摘 要： | We report an effect of enhanced emission of laser generated plume in gas ambi-ent.Nonreactive argon gas was used in the experiment of UV laser ablation of copper plate.The emission of Cu atoms from the plume was increased more than the times.The emission in-tensity is sensitive to the gas pressure,but in a certain region of gas pressure,the enhanced ef-fect can be controlled stably.For the emission lines from other element,Zn,in the plume,the intensities are subjected to the same factor of increasement.
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Enhanced emission of the laser generated plume in Ar gas |
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| Hongping Guo,Qihong Lou. Enhanced emission of the laser generated plume in Ar gas[J]. 中国激光(英文版), 1992, 0(6) |
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| Authors: | Hongping Guo Qihong Lou |
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| Abstract: | We report an effect of enhanced emission of laser generated plume in gas ambient. Nonreactive argon gas was used in the experiment of UV laser ablation of copper plate. The emission of Cu atoms from the plume was increased more than the times. The emission intensity is sensitive to the gas pressure, but in a certain region of gas pressure, the enhanced effect can be controlled stably. For the emission lines from other element, Zn, in the plume, the intensities are subjected to the same factor of increasement. |
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| Keywords: | laser plume Ar gas Cu-target emission enhancing |
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