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Line-scan sequential lateral solidification of Si thin films |
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| Authors: | RS Sposili JS Im |
| Institution: | (1) Program in Materials Science, Columbia University, 500 W. 120th St., 1106 S.W. Mudd, New York, NY 10027, USA (Fax: +1-212/854-7081, E-mail: rss28@columbia.edu; ji12@columbia.edu), US |
| Abstract: | Received: 14 April 1998/Accepted: 22 April 1998 |
| Keywords: | PACS: 64 70 Dv 81 10 -h 85 40 Hp |
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