Synthesis and characterization of Ti–Ni shape memory alloy thin films by pulsed laser deposition

Shape-memory alloys are crucial in various industrial fields. However, a high-quality film synthesis method has not been established yet. Here we examine optimum conditions for synthesis of thin films by pulsed laser deposition of Ti–Ni alloy target in vacuum. We investigated surface morphologies and chemical compositions of the films which were obtained under various conditions. We found that the suitable Ti/Ni ratio was obtained by adjusting the distance between the target and the substrate in vacuum. In parallel, we analyzed plasma plume by optical emission spectroscopy and time-of-flight mass spectrometry. We discuss the basic behavior of ablated particles in vacuum.