| 微波等离子体化学气相沉积金刚石薄膜形貌分析 |
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| 引用本文： | 方莉俐 吴宝善. 微波等离子体化学气相沉积金刚石薄膜形貌分析[J]. 高压物理学报, 1991, 5(3): 197-204 |
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| 作者姓名： | 方莉俐 吴宝善 |
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| 作者单位： | 机电部郑州磨料磨具磨削研究所(方莉俐，张战，李嘉，马丽莹，赵毫民，于鸿昌)，兰州大学(吴宝善) |
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| 摘 要： | 本文给出了微波等离子体化学气相沉积多晶金刚石薄膜及外延单晶金刚石薄膜的各种形貌，并对这些形貌的形成作了理论分析。
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| 关 键 词： | 金刚石薄膜 微波化学气相沉积 形貌 |
| 收稿时间： | 1991-02-02; |
ANALYSIS OF THE MORPHOLOGIES OF DIAMOND FILM GROWN BY MICROWAVE PLASMA CVD METHOD |
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| Fang Lili,Zhang Zhan,Li Jia,Ma Liying,Zhao Haomin,Yu Hongchang. ANALYSIS OF THE MORPHOLOGIES OF DIAMOND FILM GROWN BY MICROWAVE PLASMA CVD METHOD[J]. Chinese Journal of High Pressure Physics, 1991, 5(3): 197-204 |
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| Authors: | Fang Lili Zhang Zhan Li Jia Ma Liying Zhao Haomin Yu Hongchang |
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| Affiliation: | 1. Zhengzhou Research Institute for Abrasives &; Grinding, Ministry of Machinery &; Electronics Industry, Zhengzhou 450007, China;2. Lanzhou University, Lanzhou 730000, China |
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| Abstract: | In this paper, morphologies of poly crystal line diamond film and epitaxial single-crystal diamond film by microwave plasma CVD method were reported,the causes of these morphologies were analyzed. |
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| Keywords: | diamond film microwave plasma CVD morphology. |
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