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采用溶液沉积及快速退火制备LiMn2O4薄膜的研究
引用本文:吴显明,李润秀,何则强,陈上.采用溶液沉积及快速退火制备LiMn2O4薄膜的研究[J].人工晶体学报,2009,38(1):221-225.
作者姓名:吴显明  李润秀  何则强  陈上
作者单位:吉首大学化学化工学院,吉首,416000;吉首大学化学化工学院,吉首,416000;中南大学化学化工学院,长沙,410083
基金项目:国家自然科学基金,湖南省教育厅自然科学基金 
摘    要:采用溶液沉积及快速退火制备了不同厚度的LiMn2O4薄膜,用X射线衍射及扫描电子显微镜检测分析薄膜的物相及形貌;采用恒电流充放电及交流阻抗技术研究了LiMn2O4薄膜的电化学性质.结果表明,制备的LiMn2O4薄膜均匀,晶粒大小相近,晶粒尺寸在20~50 nm之间.经热处理后LiMn2O4薄膜断面清晰,薄膜与基片之间扩散很轻微.随着薄膜厚度的增加,薄膜的粗糙度减小,平整度变好.不同厚度的LiMn2O4薄膜的比容量介于42~47 μAh/(cm2·μm)之间,经50次循环后,薄膜的容量损失率从0.18 μm的0.64;上升到1.04 μm的9.0;,循环性能随着薄膜厚度的增加而变差.电化学阻抗测试表明不同厚度的LiMn2O4薄膜锂离子扩散系数差别不大,数量级为10-11cm2/s.

关 键 词:LiMn2O4  薄膜  锂离子  扩散  电化学  

Characterization of Solution-deposited LiMn_2O_4 Thin Films with Different Thickness Heat-treated by Rapid Thermal Annealing
WU Xian-ming,LI Run-xiu,HE Ze-qiang,CHEN Shang.Characterization of Solution-deposited LiMn_2O_4 Thin Films with Different Thickness Heat-treated by Rapid Thermal Annealing[J].Journal of Synthetic Crystals,2009,38(1):221-225.
Authors:WU Xian-ming  LI Run-xiu  HE Ze-qiang  CHEN Shang
Institution:1.College of Chemistry and Chemical Engineering;Jishou University;Jishou 416000;China;2.College of Chemistry and Chemical Engineering;Central South Unversity;Changsha 410083;China
Abstract:LiMn2O4 thin films of different thickness were prepared by solution deposition and rapid thermal annealing.The phase identification and surface morphology were studied by X-ray diffraction and scanning electron microscopy.The electrochemical properties of thin films were carried out by galvanostatic charge-discharge experiments and electrochemical impedance spectroscopy.The films of different thickness are homogeneous with the grain size between 20-50 nm.The cross section of the film is very clear.The film ...
Keywords:LiMn2O4
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