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Numerical Calculation and Analysis of Track Etching Process
作者姓名:ZhuZhiyong  DuanJinlai  SunYoumei  Y.Maekawa  H.Koshikawa  M.Yoshida
摘    要:Heavy ion irradiated polymers can be chemically etched to form track membrane with pores in the micro and sub-micro ranges. It has been reported that pore growth during etching can be related to track structures. A latent track has a track core inside and a track halo surrounding the track core. By single track etching it is observed that etching in the track core is much faster than in the track halo where the etching rate is even lower tlian that of bulk material. For multi-track etching, no such stages can be seen by the conductance measurements.

关 键 词:数字计算  轨迹刻画处理  重离子  放射性聚合体
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