X-ray absorption spectroscopy in total electron yield mode of scanning photoelectron microscopy |
| |
| Institution: | 1. Department of Physics, Pohang University of Science and Technology (POSTECH), Pohang, Republic of Korea;2. Pohang Accelerator Laboratory, POSTECH, Pohang, Republic of Korea;1. Laboratoire de Physique des Matériaux et des Nanomatériaux Appliquée à l’Environnement, Faculté des Sciences de Gabès, Cité Erriadh Manara Zrig, 6072 Gabès, Tunisia;2. Al Imam Mohammad Ibn Saud Islamic University (IMSIU), College of Sciences, Department of Physics, Riyadh 11623, Saudi Arabia;3. Dep. de Fisica Aplicada, Universidad Politécnica de Cartagena (UPCT), Campus Alfonso XIII, 30203 Cartagena, Spain;1. Department of Physics Simulation Lab, The Islamia University of Bahawalpur, 63100, Pakistan;2. Department of Physics, National University of Singapore, 2 Science Drive 3, Singapore 117542, Singapore;3. Department of Electrical and Computer Engineering, The University of Alabama, Tuscaloosa, AL 35487, USA;4. Center for Materials for Information Technology, The University of Alabama, Tuscaloosa, AL 35487, USA;1. CNR-NANO, via G. Campi 213/a, 41125 Modena, Italy;2. Dipartimento FIM, Università di Modena e Reggio Emilia, via G. Campi 213/a, 41125 Modena, Italy;3. CNR-ISM, Via Fosso del Cavaliere 100, 00133 Roma, Italy;4. CNR-IMEM, Parco Area delle Scienze 37/a, 43124 Parma, Italy;5. Laboratorio di Nanotecnologie, Istituto di Scienze e Tecnologie Molecolari, Consiglio Nazionale delle Ricerche, via G. Fantoli 16/15, 20138 Milano, Italy;1. Complex Hydride Materials Research Group, Dalian National Laboratory for Clean Energy, Dalian Institute of Chemical Physics, Chinese Academy of Sciences, Dalian 116023, China;2. School of Materials Sciences and Engineering, Southeast University, Nanjing 211189, China;1. Institute of Metal Physics, Ural Branch of Russian Academy of Sciences, 620041 Ekaterinburg, Russia;2. Novosibirsk State Technical University, 630092 Novosibirsk, Russia |
| |
| Abstract: | Total electron yield (TEY) measurement was applied to the scanning photoelectron microscopy (SPEM). The resultant image showed the thickness variation of a zinc overlayer deposited on an iron substrate with 18 nm nominal thickness. The contrast and signal-to-noise ratio of the image were much higher than those of the images obtained by the conventional SPEM. When the order-sorting aperture (OSA) located between the Fresnel zone plate and the sample was biased to +80 V relative to the sample, the contrast of the image was further improved. It also made it possible to perform microscopic X-ray absorption spectroscopy in TEY mode by preventing the unwanted photoelectrons emitted from the OSA, which can cause false TEY, from reaching the sample. Oxidized areas of the iron substrate under the thick zinc overlayer were clearly identified. |
| |
| Keywords: | |
| 本文献已被 ScienceDirect 等数据库收录！ |
|
