Emission Theory of Amorphous Material Sputtering: the Dependence of the Sputtering Coefficient on the Angle of Primary Ion Beam Incidence |
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Authors: | A N Pustovit |
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Institution: | 1.Institute of Microelectronic Technology and High-Purity Materials,Russian Academy of Sciences,Chernogolovka, Moscow oblast,Russia |
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Abstract: | The dependences of the sputtering coefficient on the types of accelerated ions, their energy, and the angle of incidence on a target are calculated. For Ar–Si, Хе–С, and H–W systems, acceptable coincidence between the calculated and experimental data is obtained. Two mechanisms for secondary-particle ejection from solids are established; they determine the dependences of the base sputtering coefficient for the base on the energy and the angle of primary ion incidence on the target. |
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