Multilayer graphene/amorphous carbon hybrid films prepared by microwave surface‐wave plasma CVD: synthesis and characterization |
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| Authors: | Susumu Ichimura Yasuhiko Hayashi Masayoshi Umeno |
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| Affiliation: | 1. Department of Electrical and Electronic Engineering, Okayama University, Okayama, Japan;2. Institute for General Research of Science, Chubu University, Kasugai, Aichi, Japan |
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| Abstract: | Hybrid films of multilayer graphene (MG) containing amorphous carbon (a‐C) were synthesized on Al substrates by microwave surface‐wave plasma chemical vapor deposition. Raman scattering and surface transmission electron microscopy showed that the carbon films contained a large quantity of MG when a radio frequency (RF) substrate bias was not applied. Amorphization of graphene in the carbon film was promoted by applying an RF bias, which generated Ar+ in the plasma. The bandgaps of the films were found to increase as the Raman intensity ratios between the 2D‐band (at 2700 cm?1) and D‐band (at 1350 cm?1) decreased, indicating the formation of a‐C. The MG/a‐C all‐sp2 phase of carbon hybrid films exhibited an increase in current density under 5 mW/cm2 of AM1.5G solar simulated irradiation as the RF bias increased because of Ar+‐induced amorphization of the graphene. Copyright © 2016 John Wiley & Sons, Ltd. |
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| Keywords: | hybrid carbon film microwave surface‐wave plasma CVD graphene amorphous carbon Raman transmission electron microscopy (TEM) |
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