Study on the anti‐reflection and structure evolution of hydrogenated amorphous carbon grown by plasma chemical vapor deposition |
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| Authors: | Jing Shi Zhongrong Geng Junyan Zhang Chengbing Wang |
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| Affiliation: | 1. School of Mechanic and Electronic Engineering, Lanzhou Jiaotong University, , Lanzhou, 730070 China;2. State Key Laboratory of Solid Lubrication, Lanzhou Institute of Chemical Physics, Chinese Academy of Sciences, , Lanzhou, 730000 China;3. National Engineering Research Center for Technology and Equipment of Green Coating, Lanzhou Jiaotong University, , Lanzhou, 730070 China |
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| Abstract: | In this work, the interrelation between the anti‐reflective property and the component, especially the sp2 content, was studied. The results showed that the refraction index n increased from 2.2 to 3.3 with the direct current negative bias increasing. The reflection result R successful fall by 11.9% because of the existence of hydrogenated amorphous carbon anti‐reflective coatings. Both the refraction index and reflectivity decreasing correspond to a more graphitic microstructure character. Moreover, the optical property evolution of the films was explained by the chemical vapor deposition mechanism based on the ion sub‐plantation model and two‐phase model. Copyright © 2014 John Wiley & Sons, Ltd. |
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| Keywords: | hydrogenated amorphous carbon direct current plasma‐enhanced chemical vapor deposition anti‐reflection property raman spectroscopy X‐ray photoelectron spectroscopy |
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