Si过渡层类金刚石薄膜界面优化及其性能研究

本文中利用等离子体化学气相沉积法,制备了具有Si过渡层的DLC薄膜.利用俄歇深度分析的方法,研究了Si过渡层沉积条件如电压、气压和气源对Si过渡层的影响;利用薄膜应力分布测试仪和划痕仪,研究了不同沉积条件下制备的Si过渡层对类金刚石薄膜内应力和附着力特性的影响;利用摩擦磨损仪,分析比较了薄膜的摩擦性能.研究表明:DLC薄膜与基底之间形成(Fe+Si+O混合层)/Si/(Si+C混合层)过渡层.过渡层制备过程中,气压、电压和Ar/Si H4比例升高,会导致过渡层中Si层厚度的减小.这种过渡层在一定范围内提高了DLC薄膜与基体之间的结合力,缓解了因薄膜与基底间不匹配而产生的应力.在大气环境下,优化的DLC薄膜与GCr 15钢对偶的摩擦系数及磨损率可低至0.02和8.2×10-14m3/(N·m).

Interface Optimization and Property Investigation of DLC Film with Si Transition Layer

Diamond-like carbon/Silicon films were deposited on 304 stainless steels by plasma enhanced chemical vapor deposition. The influence of parameter for transition layer on the transition layer structure was investigated by Auger electron spectroscopy techniques. Residual stress, adhesive strength and tribological property were evaluated using interferometry, scratch, and reciprocating sliding friction testing. Results show that a transition layer consist of (Fe-Si-O)/Si/(Si-C) was developed between substrate and DLC film. The thickness of transition layers were decreased along with the increase of pressure, voltage and the ratio of Ar/SiH₄. The transition layer improved the adhesion of DLC film and released the stress due to a mismatch between the film and substrate. The coefficient of friction and wear rate of DLC films against GCr 15 steel ball under atmosphere was as low as 0.02 and 8.2×10^-14 m³/(N·m), respectively.