The kinetics of photodissolution of Ag in amorphous As2S3 films

A new technique, measurement of the electrical resistance change of the Ag layer, is developed to study the kinetics of photodissolution of Ag in amorphous As₂S₃. It is shown that the photodissolution rate is proportional to the light intensity absorbed in the As₂S₃ at the As₂S₃Ag interface, but photoelectrons ejected from the Ag into the As₂S₃ also contribute. The process is shown to be two-stage. Firstly a critical “radiation damage” dose must be accumulated in the As₂S₃. Secondly, the Ag atom is photon-assisted across the As₂S₃Ag interface activation barrier.