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MOSFET衬底电流模型在深亚微米尺寸下的修正
引用本文:孙自敏,刘理天,李志坚.MOSFET衬底电流模型在深亚微米尺寸下的修正[J].半导体学报,2000,21(2):151-155.
作者姓名:孙自敏  刘理天  李志坚
作者单位:清华大学微电子所!北京100084
摘    要:建立精确的衬底电流模型是分析MOSFET器件及电路可靠性和进行MOSFET电路设计所必需的.在分析载流子输运的基础上建立了一个常规结构深亚微米MOSFET衬底电流的解析模型,模型公式简单.对模型进行了验证,研究了衬底掺杂浓度与栅氧化层厚度对拟合因子的影响,并分析了模型中拟合因子的物理意义.

关 键 词:MOSFET    衬底电流    深亚微米
文章编号:0253-4177(2000)02-0151-05
修稿时间:1998年10月12日

Modification of MOSFET's Substrate Current Model in Deep Submicrometer Regime
SUN Zi\|min,LIU Li\|tian and LI Zhi\|jian.Modification of MOSFET's Substrate Current Model in Deep Submicrometer Regime[J].Chinese Journal of Semiconductors,2000,21(2):151-155.
Authors:SUN Zi\|min  LIU Li\|tian and LI Zhi\|jian
Abstract:For the reliability analysis and the design of MOSFET's circuits, it is necessary to model the substrate current accurately.This paper establishes a substrate current model of conventional deep\|submicrometer MOSFET's on the base of carrier transport. Non\|local transport is considered in the model. The model is simple and proved to fit the experiments very well. The influences of substrate doping concentration and gate oxide thickness to fitting factors are also presented. The physical meanings of the fitting factors are analyzed.
Keywords:MOSFET  Substrate Current  Deep Submicrometer
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