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铜在低电导溶液中扩散机理的研究
引用本文:冯益其,周国定.铜在低电导溶液中扩散机理的研究[J].物理化学学报,1994,10(5):472-475.
作者姓名:冯益其  周国定
作者单位:Shanghai Institute of Electric Power, Shanghai 200090
摘    要:双水内冷发电机空芯铜导线的腐蚀问题直接影响到火电厂发电机的安全经济运行.其腐蚀体系为纯铜和低电导水溶液(pH=7.3,空气饱和,电导率<10μS·cm-1).我们已经用交流阻抗法对该体系进行了一些研究.由于该体系溶液电导率低,在交流阻抗谱的高频区出现高频半圆;低频区为一条文于实轴Z约45°的直线(不加缓蚀剂时).如果在该体系中MABTA、MBT等缓蚀剂,低频区直线变为半圆.所以,低频区的阻抗代表了电极表面的特征,而高频区(如10k~100kHz范围)半圆是由于参比回路(包括参比电极、盐桥、鲁金毛细管等)中存在太大的电阻…

关 键 词:铜电极  低电导溶液  Warburg阻抗  Warburg系数  扩散  
收稿时间:1992-11-14
修稿时间:1993-04-12

Study on Diffusion Mechanism for Copper in Low-conductivity Solution
Feng Yiqi, Zhou Guoding.Study on Diffusion Mechanism for Copper in Low-conductivity Solution[J].Acta Physico-Chimica Sinica,1994,10(5):472-475.
Authors:Feng Yiqi  Zhou Guoding
Institution:Shanghai Institute of Electric Power, Shanghai 200090
Abstract:The cause of Warburg impedance on the impedance spectra for copper electrode in low-conductivity solution has been studied. The slopes of Randles plots (Warburg coefficients) do not change with dissolved oxygen concentration and strring rate, but they increase with the increase of the pH of solution and driesion time. The experimental results show that the Warburg twedance at low frequencies is caused by the diffusion of copper ions from the inner side to the outer side of the oxide film on the surface of copper electrode.
Keywords:Copper electrode  Low-conductivity solution  Warburg impedance  Warburg coefficient  Diffusion  
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