Speciation of BCxNy films grown by PECVD with trimethylborazine precursor |
| |
| Authors: | Olaf Baake Peter S Hoffmann Andreas Klein Beatrix Pollakowski Burkhard Beckhoff Marina L Kosinova Nadeshda I Fainer Veronica S Sulyaeva Valentina A Trunova and Wolfgang Ensinger |
| |
| Institution: | (1) Department of Materials Science, Technische Universit?t Darmstadt, Petersenstr. 23, 64287 Darmstadt, Germany;(2) Physikalisch-Technische Bundesanstalt, Abbestr. 2-12, 10587 Berlin, Germany;(3) Russian Academy of Sciences, Nikolaev Institute of Inorganic Chemistry Siberian Branch, Acad. Lavrentyev Pr. 3, Novosibirsk, 630090, Russia; |
| |
| Abstract: | Films of BC
x
N
y
were produced in a plasma-enhanced chemical vapor deposition process using trimethylborazine as precursor and with H2, He, N2, and NH3, respectively, as auxiliary gas. These films deposited on Si(100) wafers or fused quartz glass substrates were characterized
chemically by X-ray photoelectron spectroscopy and by synchrotron radiation-based total-reflection X-ray fluorescence combined
with near-edge X-ray absorption fine structure. Independent of the auxiliary gas, the B–N bonds are dominating. Furthermore,
B–C and N–C bonds were identified. Oxygen, present in the bulk (in contrast to the surface layer of some nanometers, where
molecular oxygen and/or water are absorbed) as an impurity, is bonded to boron or to carbon, respectively. The relation of
boron and nitrogen changes with the character of the auxiliary gas: c
B/c
N ≈ 4:3 (for H2 and He) and c
B/c
N ≈ 1 (for N2 or NH3). Furthermore, physical properties such as the refractive index and the optical band-gap energy were determined. |
| |
| Keywords: | |
| 本文献已被 SpringerLink 等数据库收录！ |
|
