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Effects of X-ray radiation on the surface chemical composition of plasma deposited thin fluorocarbon films |
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| Authors: | M. Himmerlich A. Opitz J.A. Schaefer |
| Affiliation: | a Institut für Physik and Institut für Mikro- und Nanotechnologien, Technische Universität Ilmenau, P.O. Box 100565, 98684 Ilmenau, Germany b Fraunhofer Institut für Integrierte Systeme und Bauelementetechnologie, Schottkystraße 10, 91058 Erlangen, Germany c Institut für Physik, Universität Augsburg, 86153 Augsburg, Germany |
| Abstract: | Different thin fluorocarbon (FC) films were deposited on Si(111) using plasma polymerisation and then exposed to X-ray radiation. Changes in the chemical composition of the deposited fluorocarbon films as a function of irradiation time were investigated in situ using X-ray photoelectron spectroscopy. The evaluation of the C1s and F1s core level induced emission as a function of exposure to X-ray radiation (Mg Kα, hν = 1253.6 eV) reveals changes in the surface chemical composition of the FC polymer structure. The presented results indicate a high defluorination under X-ray irradiation. Additionally, binding energy shifts of the F1s and C1s peaks during the exposure associated with surface charging effects were observed. With ongoing exposure the surface charging decreases continuously and the FC surfaces become more conductive due to changes in the polymer structure. Different models have been used to describe the decomposition kinetics and surface composition. |
| Keywords: | Fluorocarbon films Plasma polymerisation X-ray irradiation X-ray photoelectron spectroscopy Fluorocarbon degradation |
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