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Cathodoluminescence study of the excitons localization in AlGaN/GaN and InGaN/GaN quantum wells grown on sapphire
Affiliation:1. Korea Institute of Ceramic Engineering & Technology, 15-5, Chungmugong-dong, Jinju-si, Gyeongsangnam-do 52851, Republic of Korea;2. Metamaterial Electronic Device Research Center, Hongik University, Seoul 121-791, Republic of Korea
Abstract:Al0.1Ga0.9N(5 nm)/GaN(2 nm) and In0.2Ga0.8N/GaN quantum wells (QWs) grown on GaN/sapphire have been studied by cathodoluminescence (CL) spectroscopy and imaged using an experimental setup especially developed for scanning near-field CL microscopy, which combines a scanning force microscope and a scanning electron microscope. The CL spectra show the characteristic band edge emission peak of GaN at λ= 364 nm and the emission peaks related to the presence of QWs, at λ= 353 and 430 nm for the AlGaN/GaN and the InGaN/GaN samples, respectively. Monochromatic CL images reveal that the emission of the AlGaN/GaN and InGaN/GaN QWs is localized at the level of the grains observed by SFM. A cross sectional analysis of the InGaN/GaN sample gives insight into its growth and an estimation of the exciton diffusion length of about L=180 nm.
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