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Interactions between inversion domains and InGaN/GaN multiple quantum wells investigated by transmission electron microscopy
Affiliation:1. Satellite Venture Business Laboratory, The University of Tokushima, 2-1 Minami-josanjima, Tokushima 770-8506, Japan;2. Nitride Semiconductor Co., Ltd.,115-7 Itayajima, Akinolami, Seto-cho, Naruto-shi, Tokushima 771-0360, Japan;3. Department of Electrical and Electronic Engineering, The University of Tokushima, 2-1 Minami-josanjima, Tokushima 770-8506, Japan
Abstract:The propagation properties of inversion domains (IDs) in InGaN/GaN multiple quantum well (MQW) structures grown by metalorganic chemical vapor deposition have been investigated by transmission electron microscopy (TEM). The majority of the IDs, originating from the sapphire and/or buffer layer, propagate through the MQWs with normal wurtzite structure retaining their original structural features. Some of IDs could induce V-shaped pits in the MQW structures proposing a new formation mechanism for the so-called V-shaped defects. Detailed measurements show that a few IDs are found to be stopped in abnormal MQW regions, where In droplets appear due to phase separation. We presented direct evidence of pure In-phase droplets by means of high-resolution TEM. The above results provide new information on the structural defects in InGaN/GaN-based materials.
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