Discharge pumped C1F laser at 285 nm |
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Authors: | M Diegelmann D Proch Zhao Zhensheng |
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Institution: | (1) Dornier System GmbH, D-7990 Friedrichshafen, Germany;(2) MPI für Quantenoptik, D-8046 Garching, Germany;(3) Anhui Institute of Optics and Fine Mechanics, Hefei, People's Republic of China |
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Abstract: | This paper reports on experiments carried out in order to improve the performance of the TEA discharge pumped C1F uv laser at 285 nm. Factors which influence the gas degradation with increasing operating time, resulting in a decrease of laser output power, were investigated, aiming at a better understanding of the relevant mechanisms. By optimizing several parameters, laser pulse energies beyond 25 mJ were obtained in a high-pressure discharge laser chamber. C1F lasing has also been demonstrated in a commercially available multigas TEA laser system.As a byproduct of our C1F experiments, laser action on the correspondingD![prime](/content/p737610jp1308k66/xxlarge8242.gif) A transition of Cl2 at 258 nm has also been achieved for the first time in a discharge laser chamber. |
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Keywords: | 42 55H 82 30 42 60B |
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