| 电子回旋共振等离子分解CH19Si2N制备SICNB膜XPS分析 |
| |
| 引用本文： | 张大忠,孙官清.电子回旋共振等离子分解CH19Si2N制备SICNB膜XPS分析[J].原子与分子物理学报,1998,15(2):235-239. |
| |
| 作者姓名： | 张大忠 孙官清 |
| |
| 作者单位： | 四川大学原子核科学技术研究所 |
| |
| 摘 要： | 电子回旋共振等离子分解ＣＨ１９Ｓｉ２Ｎ－Ｎ２混合气体，采用溅射共混、气相液相共混沉积技术，制备四元素ＳｉＣＮＢ膜，由ＸＰＳ分析了膜的成份及生成的键结构，发现溅射共混、气液共混沉积过程中聚合成了Ｃ－Ｎ、Ｃ－Ｂ、Ｎ－Ｂ、Ｓｉ－Ｃ化合物。
|
| 关 键 词： | 电子回旋共振 共混沉积 化学键 |
XPS ANALYSIS OF SICNB FILM SYNTHESIZED BY ELECTRON CYCLOTRON RESONANCE PLASMA DECOMPOSITION CH 19 Si 2N-N 2 |
| |
| Zhang Dazhong,Sun Guanging,Liu Zhongyang,Chen Jianzuan,Insitute of Nuclear Science and Technology Sichuan University Chengdu P.R.C.XPS ANALYSIS OF SICNB FILM SYNTHESIZED BY ELECTRON CYCLOTRON RESONANCE PLASMA DECOMPOSITION CH 19 Si 2N-N 2[J].Journal of Atomic and Molecular Physics,1998,15(2):235-239. |
| |
| Authors: | Zhang Dazhong Sun Guanging Liu Zhongyang Chen Jianzuan Insitute of Nuclear Science and Technology Sichuan University Chengdu PRC |
| |
| Institution: | Zhang Dazhong Sun Guanging Liu Zhongyang Chen Jianzuan Insitute of Nuclear Science and Technology Sichuan University Chengdu P.R.C |
| |
| Abstract: | The paper report formation of four elements SiCNB film by electron cyclotron resonance plasma decomposed CH 19 Si 2N-N 2hybrid gas assisted sputter Co-mixing and gas-liquid phase Co-mixing technology. composition and chemical bond of film were analysized by XPS. Expriment showed that formation of Si-c, C-B, C-N, B-N vond as well as Bc 2N structure in the films at sputter Co-mixing and gas-liquid phase Co-miximg. |
| |
| Keywords: | Electron cyclotron resonance Co-mixing deposition Chemical bond |
| 本文献已被 CNKI 维普 等数据库收录！ |
| 点击此处可从《原子与分子物理学报》浏览原始摘要信息 |
| 点击此处可从《原子与分子物理学报》下载免费的PDF全文 |
