Femtosecond laser color marking of metal and semiconductor surfaces

Color marking of rough or smooth metal (Al, Cu, Ti) and semiconductor (Si) surfaces was realized via femtosecond laser fabrication of periodic surface nanorelief, representing one-dimensional diffraction gratings. Bright colors of the surface nanorelief, especially for longer electromagnetic wavelengths, were provided during marking through pre-determined variation of the laser incidence angle and the resulting change of the diffraction grating period. This coloration technique was demonstrated for the case of silicon and various metals to mark surfaces in any individual color with a controllable brightness level and almost without their accompanying chemical surface modification.