Influence of background carriers on magnetic properties of Mn-doped dilute magnetic Si |
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Authors: | S Mukhopadhyay Nicholas M Harrison |
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Institution: | 1. Department of Materials, Imperial College London, Exhibition Road, London SW7 2AZ, United Kingdom;2. Department of Chemistry, Imperial College London, Exhibition Road, London SW7 2AZ, United Kingdom;3. Thomas Young Center: The London Center for Theory and Simulation of Materials, Imperial College London, Exhibition Road, London SW7 2AZ, United Kingdom |
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Abstract: | Using hybrid exchange density functional calculations we show that the type of background carriers has profound effects on magnetic interactions in Mn doped dilute magnetic Si. The p- and n-type Si were simulated by introducing an extra hole and an extra electron, respectively in the 64 atoms Si supercell. In case of p-type Si compensated by a homogeneous background potential and 1.6% Mn, the ground state is ferromagnetic, whereas other conditions remaining the same, the ground state becomes antiferromagnetic for the n-type Si. The exchange energies in Mn-doped extrinsic Si are higher by about 1 eV/Mn atom compared to the Mn doped intrinsic Si. Calculated electronic structures reveal that in p-type Si:Mn the hole localises over Mn and the short range magnetic coupling increases. Our calculations indicate that localisation of magnetic polarons at the Mn site is likely, which in turn enhances long range magnetic interaction between Mn ions and responsible for FM stabilisation. On the other hand, in the n-type host electron–electron repulsion increases within Mn–Si impurity band and the short range coupling decreases, which destroys the long range spin polarisation. These calculations explain the observed ferromagnetism in the p-type Si:Mn at higher temperatures than in the n-type Si:Mn and the magnetic moments of the systems compare well with experiments. |
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Keywords: | Spintronic Dilute magnetic silicon Magnetism Silicon Mn doped silicon |
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