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Self-Supporting Polymer Films for MEMS Applications |
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| Authors: | Andreas Nocke Marcus Wolf Helmut Budzier Jens Monch Karl-Friedrich Arndt Gerald Gerlach |
| Affiliation: | 1. Technische Universität Dresden, Institute for Solid-State Electronics, 01062 Dresden, Germany;2. Leibniz Institute for Solid State and Materials Research Dresden, 01069 Dresden, Germany;3. Technische Universität Dresden, Institute of Physical Chemistry and Electro-chemistry, 01062 Dresden, Germany |
| Abstract: | Summary: The fabrication of a self supporting novolac-based photoresist layer is demonstrated. A technology is presented using a sacrificial layer of PMMA and a carrier layer of photosensitive PI. The solely use of polymers for the creation of a self-supporting structure is distinguished by simple processing and relatively low cost materials. Additionally the mechanical stability of the self-supporting layer is under consideration. Finally the cross-linking process of the novolac-based photoresist by curing is discussed using FTIR, DSC and TGA measurements. |
| Keywords: | cross-linking novolac PMMA sacrificial layer technique self-supporting layer |