| 热处理条件对热蒸镀WO3薄膜结构的影响 |
| |
| 引用本文： | 方国家,姚凯伦,王豫,刘祖黎. 热处理条件对热蒸镀WO3薄膜结构的影响[J]. 华中科技大学学报(自然科学版), 2000, 28(9): 110-112 |
| |
| 作者姓名： | 方国家 姚凯伦 王豫 刘祖黎 |
| |
| 作者单位： | 1. 华中理工大学激光技术国家重点实验室
2. 华中理工大学物理系 |
| |
| 基金项目： | 国家自然科学基金资助项目(19775016);湖北省自然科学基金资助项目(99J049). |
| |
| 摘 要： | 采用高真空热蒸发沉积技术在硅单晶Si(111)衬底上沉积了WO3薄膜.借助化学刻蚀,SEM,XRD和Raman光谱分析等手段,研究了不同的热处理条件(大气环境,真空,不同气氛)对WO3薄膜结构的影响.结果表明,在真空条件下或干燥Ar气氛条件下对薄膜进行退火热处理有利于控制薄膜晶粒的生长(保持薄膜良好的电致变色性能),同时有利于增强薄膜的稳定性.
|
| 关 键 词： | WO3薄膜 热蒸发 热处理条件 结构 |
| 文章编号： | 1000-8616(2000)09-0110-03 |
| 修稿时间： | 2000-02-15 |
The Effect of Annealing Conditions on the Structural Properties of Thermal Evaporated WO3 Thin Films |
| |
| Fang Guojia Yao Kailun Wang Yu Liu Zuli State Key Lab of Laser Technology,HUST,Wuhan ,China.. The Effect of Annealing Conditions on the Structural Properties of Thermal Evaporated WO3 Thin Films[J]. JOURNAL OF HUAZHONG UNIVERSITY OF SCIENCE AND TECHNOLOGY.NATURE SCIENCE, 2000, 28(9): 110-112 |
| |
| Authors: | Fang Guojia Yao Kailun Wang Yu Liu Zuli State Key Lab of Laser Technology HUST Wuhan China. |
| |
| Affiliation: | Fang Guojia Yao Kailun Wang Yu Liu Zuli State Key Lab of Laser Technology,HUST,Wuhan 430074,China. |
| |
| Abstract: | WO 3 thin films are deposited on Si (111) by the high vacuum thermal evaporation method. Thin films are heat treated at different temperatures and ambient atmosphere (such as in vacuum, dry or wet Argon). The microstructure, morphology of the samples before and after heat treatments have been studied with chemical etching, SEM, XRD and Raman spectrum. The experiment illustrates that grain growth in the samples annealed in vacuum or dry argon flow conditions can be controlled. The thin films have good electrochromic properties and improved stability. |
| |
| Keywords: | WO 3 thin films thermal evaporation post heat treatment conditions structural properties. |
| 本文献已被 CNKI 万方数据 等数据库收录！ |
