Determination of the linear attenuation range of electron transmission through film specimens |
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| Authors: | Fang Wang Hai-Bo Zhang Meng Cao Ryuji Nishi Akio Takaoka |
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| Institution: | 1. Key Laboratory for Physical Electronics and Devices of the Ministry of Education, Department of Electronic Science and Technology, Xi’an Jiaotong University, Xi’an 710049, People''s Republic of China;2. Research Center for Ultrahigh Voltage Electron Microscopy, Osaka University, 7-1 Mihogaoka, Ibaraki, Osaka 567-0047, Japan;1. Trinity College Dublin, School of Chemistry-CRANN, Dublin 2, Dublin, Ireland;2. Instituto de Ciencia de Materiales de Madrid (ICMM), Consejo Superior de Investigaciones Científicas (CSIC), C/ Sor Juana Inés de la Cruz 3, 28049 Madrid, Spain;3. Centro de Investigación de Nanomateriales y Nanotecnología-Consejo Superior de Investigaciones Científicas (CSIC),-Universidad de Oviedo-Principado de Asturias), (CINN-CSIC-UNIOVI-PA), Parque Tecnológico de Asturias, Llanera 33428, Spain;4. Moscow State University of Technology STANKIN, Vadkovskij per. 1, Moscow Oblast, 101472 Moscow, Russian Federation;1. School of Mechanical and Electrical Engineering, Hunan University of Science and Technology, Xiangtan 411201, PR China;2. High Temperature Wear Resistant Materials and Preparation Technology of Hunan Province National Defence Science and Technology Laboratory, Xiangtan 411201, PR China;3. School of Materials Science and Engineering, Central South University, Changsha 410083, PR China;1. Research Laboratory for Mechanics of New Nanomaterials, Peter the Great St. Petersburg Polytechnic University, St. Petersburg 195251, Russia;2. St. Petersburg State University, St. Petersburg 198504, Russia;3. Institute of Problems of Mechanical Engineering, Russian Academy of Sciences, St. Petersburg 199178, Russia;1. State Key Laboratory of Metastable Materials Science and Technology, Yanshan University, Qinhuangdao, Hebei 066004, PR China;2. College of Materials Science and Engineering, Yanshan University, Qinhuangdao, Hebei 066004, PR China;1. State Key Laboratory of Rare Earth Resources Utilization, Changchun Institute of Applied Chemistry, No. 5625 Renmin Street, Changchun, 130022, Jilin, China;2. University of Science and Technology of China, No. 96 Jinzhai Road, Hefei, 230026, Anhui, China |
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| Abstract: | We have investigated the linear attenuation range of electron transmission through film specimens and its dependence on the electron energy, the acceptance half-angle of a detector or an objective aperture, and specimen properties, in the scanning transmission electron microscope (STEM) and the conventional transmission electron microscope (TEM). Electron transmission in the bright-field mode was calculated by the Monte Carlo simulation of electron scattering, and its range of the linear attenuation in film thickness was then determined by a linear least squares fit. The corresponding linear thickness range was shown to increase with the electron energy and the acceptance half-angle, although it decreased with the increase in the atomic number of specimen materials. Under the condition of a 300 kV STEM or a 3 MV ultra-high voltage electron microscope (ultra-HVEM), the linear attenuation range could extend to several microns for light specimen materials, and this was validated by experimental data in the ultra-HVEM. The presented results can be helpful for accurately measuring the specimen thickness or mass from electron transmission, and estimating the deviation of electron transmission from linearity when tilting a specimen in electron tomography. |
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