Field ionization processes in field ion microscopy |
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Authors: | Iwasaki HiroshiNakamura Shogo |
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Affiliation: | Institute of Scientific and Industrial Research, Osaka University, Suita, Osaka 565, Japan |
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Abstract: | The processes of field ionization are considered by the time dependent perturbation theory. The metal wave function to be occupied by a tunneling electron from a monovalent atom is approximated by the tight-binding method. The system considered is hydrogen imaging a tungsten-type metal. The (001) crystallographic plane with an interatomic spacing of 3.16 Å and an externally applied electric field of 2.3 V/Å is considered for numerical results. Image formation mechanisms of field ion microscopy are qualitatively discussed. |
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