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Field ionization processes in field ion microscopy
Authors:Iwasaki HiroshiNakamura Shogo
Institution:Institute of Scientific and Industrial Research, Osaka University, Suita, Osaka 565, Japan
Abstract:The processes of field ionization are considered by the time dependent perturbation theory. The metal wave function to be occupied by a tunneling electron from a monovalent atom is approximated by the tight-binding method. The system considered is hydrogen imaging a tungsten-type metal. The (001) crystallographic plane with an interatomic spacing of 3.16 Å and an externally applied electric field of 2.3 V/Å is considered for numerical results. Image formation mechanisms of field ion microscopy are qualitatively discussed.
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