N离子注入对Ti—Al—Zr合金耐蚀性影响研究

经完全退火处理的Ti-Al-Zr合金表面注入不同剂量的N离子，并在pH值为10的溶液中进行电化学腐蚀试验。结果表明，N离子注入后，试样表面首先形成具有四方结构的ε-Ti2N，随着离子注入剂量的增加，四方结构的ε-Ti2N逐渐向立方结构的σ-TiN转变，X射线光电子能谱的分析结果也证实了这一变化过程；N离子的注入能明显改善Ti-Al-Zr合金表面的耐腐蚀性能，且在注入8×10^16 ion／cm^2时得到最佳的耐腐蚀性。根据原子碰撞理论对电化学腐蚀实验结果进行了理论分析。In the present investigation, fully annealed Ti-Al-Zr plates were implanted with different nitrogen fluences. The corrosion resistance was examined by the electrochemical methods in a solution with pH value of 10 at room temperature in order to determine the optimum fluenee that can give good corrosion resistance in a simulated nuclear reactor condition. The results show ε-Ti2N phase formed initially and then transformed into σ-TIN with increasing of nitrogen fluences, which was confirmed by the results of X-ray photoelectron spectroscopy （XPS）. In addition, it can be found the increase of the corrosion resistance depends on the nitrogen fluence employed and the maximum improvement of the corrosion resistance was observed with a fluence of 8 × 10^16 N^＋ ion/cm^2. The mechanism of the corrosion resistance is attributed to defect accumulation, formatio on of amorphous phase and nanocrystallization in the implanted layer.

A Study of Effect of Nitrogen Implantation on Corrosion Properties of Ti-Al-Zr Alloy

In the present investigation, fully annealed Ti-Al-Zr plates were implanted with different nitrogen fluences. The corrosion resistance was examined by the electrochemical methods in a solution with pH value of 10 at room temperature in order to determine the optimum fluenee that can give good corrosion resistance in a simulated nuclear reactor condition. The results show ε-Ti2N phase formed initially and then transformed into σ-TIN with increasing of nitrogen fluences, which was confirmed by the results of X-ray photoelectron spectroscopy （XPS）. In addition, it can be found the increase of the corrosion resistance depends on the nitrogen fluence employed and the maximum improvement of the corrosion resistance was observed with a fluence of 8 × 10^16 N^＋ ion/cm^2. The mechanism of the corrosion resistance is attributed to defect accumulation, formatio on of amorphous phase and nanocrystallization in the implanted layer.