Low-dimensional nanostructures and fullerene films on semiconductor surface |
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Authors: | R. Z. Bakhtizin A. I. Oreshkin J. T. Sadowski Y. Fujikawa T. Sakurai |
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Affiliation: | (1) Bashkir State University, Ufa, 450074, Russia;(2) Moscow State University, Moscow, 119992, Russia;(3) Institute of Materials Science, Tohoku University, Sendai 980-8578, Japan |
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Abstract: | The morphology and atomic structures of C60 fullerene films on a Bi(0001)/Si(111)-7 × 7 surface and adsorption of fluorofullerene C60F x molecules on a Si(111)-7 × 7 surface have been studied by scanning tunneling microscopy/spectroscopy and low-energy electron microscopy under ultra high-vacuum conditions. It has been shown that initial nucleation of C60 islands on the surface of an epitaxial Bi film occurs on double steps and domain boundaries, while tunnel spectra do not exhibit any significant charge transfer to the lowest unoccupied molecular orbital states. Fluorofullerene molecules allow local (at the nanoscale level) modification of Si surface through local etching. |
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