Evidence for barrier-to-well injection of carriers in high quality ZnO/Zn0.9Mg0.1O multiple quantum wells grown on (111) Si

High quality ZnO/Zn_0.9Mg_0.1O multiple quantum wells were grown on (111) Si employing epitaxial Lu₂O₃ buffer layer and a thin ZnO nucleation layer. The linewidth of the low temperature ZnO well emission is only 17 meV. The effective recombination lifetime of emission from ZnO wells is 183 ps. Temperature-dependent photoluminescence is investigated to reveal the behavior of the carriers in the multiple quantum wells. Evidence for the barrier-to-well injection is indicated from the thermal quenching of both the barrier and well emissions. Carrier localization and thermal delocalization are observed in ZnMgO cap/barriers. The depth of the local potential well is determined to be ∼7 meV$\sim 7\text{meV}$.