Conceptual problems in noble gas and fluorine chemistry,V:1 The difference in the reactions of the isoelectronic XeOF4 and IF5 with KrF+ |
| |
Authors: | Joel F. Liebman |
| |
Abstract: | The isoelectronic XeOF4and IF5 show numerous similarities: molecular geometry, formation of complexes with F- donors and acceptors, complexation with graphite and with XeF2. However, on reaction with KrF+, IF5 forms an expected IF6+ ion while XeOF4 forms XeF5+ and O2+. In this paper we discuss this discordance and present an explanation for it. Nucleophilic displacement on fluorine by IF5 forms the observed cation while the corresponding reaction with XeOF4 is predicted to form the hypofluorite (XeF4-OF)+. Subsequent substitution and elimination reactions of this hypofluorite produce the observed product. |
| |
Keywords: | |
本文献已被 ScienceDirect 等数据库收录! |
|