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一种强流脉冲电子束入射角等效计算方法
引用本文:孙剑锋, 胡杨, 孙江, 等. 一种强流脉冲电子束入射角等效计算方法[J]. 强激光与粒子束, 2015, 27: 014001. doi: 10.11884/HPLPB201527.014001
作者姓名:孙剑锋  胡杨  孙江  杨海亮  张鹏飞  金亮
作者单位:1.强脉冲辐射环境模拟与效应国家重点实验室, 西安 71 0024;;;2.西北核技术研究所, 西安 71 0024
摘    要:对电子束能量沉积剖面的变化规律进行了解释,给出了由能量损失函数和能量沉积效率函数之积表示的定性的能量沉积函数表达式。在此基础上,给出了一种关于能量沉积剖面的电子束等效入射角计算方法,分析了方法所带来的影响和适用的范围,采用蒙特卡罗方法对等效结果进行了验证。证明该方法优于入射角的算术平均,尤其在靶材浅层与混合束符合较好。

关 键 词:能量沉积剖面   强流脉冲电子束   入射角
收稿时间:2014-04-29
修稿时间:2014-10-25

An average method for intense pulsed electron beam incident angles
Sun Jianfeng, Hu Yang, Sun Jiang, et al. An average method for intense pulsed electron beam incident angles[J]. High Power Laser and Particle Beams, 2015, 27: 014001. doi: 10.11884/HPLPB201527.014001
Authors:Sun Jianfeng  Hu Yang  Sun Jiang  Yang Hailiang  Zhang Pengfei  Jin Liang
Affiliation:1. State Key Laboratory of Intense Pulsed Radiation Simulation and Effect,Xi’an 710024,China;;;2. Northwest Institute of Nuclear Technology,P.O.Box 69-10,Xi’an 710024,China
Abstract:Electron incident angles have a heavy effect on the energy deposition profile (EDP) in material of the intense pulsed electron beam. The average of electron incident angles must be taken into consideration when carrying out the diagnosis technology research and numerical simulation study, while a widely received method to solve the problem has not yet been presented. This article gives a qualitative analysis on the energy deposition function, which is formed by the energy loss function and energy deposition efficiency function. An average method of electron beam incident angles based on EDP, which is named as EDP average method, is developed, and a qualitative explanation of the electron beam EDP curve is given. The error and applicability of this method are analyzed. M-C tests are designed for comparison with theoretical analysis. The EDP average method has a better performance in calculation of the EDP than the method using arithmetic average directly, especially in the shallow of target material.
Keywords:energy deposition profile  intense pulsed electron beam  incident angles
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