硅尖阵列的制备及其在真空微电子加速度计中的应用

针对微电子器件,提出了一种简单、低成本、便于批量加工的硅尖阵列制备方法。分析了各向异性和各向同性湿法腐蚀的特点,研究了不同腐蚀液中硅尖的形成机理和腐蚀速率,采用扫描电子显微镜（SEM）观测硅尖形貌。结果表明：在质量分数40%KOH 腐蚀液中添加I2和 KI,显著减小了削角速率,得到了呈火箭尖的硅尖阵列。各向同性腐蚀采用HNA腐蚀液,腐蚀的硅尖呈埃菲尔铁塔形。通过调整腐蚀液配比,氧化锐化后,硅尖尖端曲率半径小于15 nm。该硅尖阵列已成功应用于真空微电子加速度计之中。

Fabrication of silicon tip array and its application in vacuum microelectronic accelerometer

A simple, low cost and high yield method for the fabrication of silicon tip array for potential use in microelectronic applications is proposed. Both anisotropic and isotropic wet chemical etching methods are studied. The etching mechanism, etching rate and the shape of silicon tip in different solutions are analyzed by scanning electron microscope (SEM). The results show that the undercutting rate is dramatically reduced because of adding I2 and KI in 40% mass fraction KOH solution, and a rocket tip on the upper part of silicon tip is obtained. The shape ofsilicon tip etched in HNA looks like Eiffel Tower, and the radius of curvature is less than 15 nm. This silicon tip array has been successfully integrated into the fabrication of vacuum microelectronic accelerometer.