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NSCL溅射金属离子产生研究进展(摘要)
引用本文:D.Cole,G.Machicoane,L.Tobos,P.Zavodszky. NSCL溅射金属离子产生研究进展(摘要)[J]. 中国物理 C, 2007, 31(Z1): 239-239
作者姓名:D.Cole  G.Machicoane  L.Tobos  P.Zavodszky
作者单位:National Superconducting Cyclotron Laboratory Michigan State University,East Lansing,MI 48824,USA,National Superconducting Cyclotron Laboratory,Michigan State University,East Lansing,MI 48824,USA,National Superconducting Cyclotron Laboratory,Michigan State University,East Lansing,MI 48824,USA,National Superconducting Cyclotron Laboratory,Michigan State University,East Lansing,MI 48824,USA
摘    要:Production of metallic ion beams in support of the experimental program at the Coupled Cyclotron Facility at the NSCL required the development of ion sputtering feed of metallic molybdenum,nickel,uranium, and zirconium for use with the ARTEMIS ion source.The production of high intensity lower to medium charge state ions required high material consumption,posing some significant difficulties in reliable long term beam stability.Resultant and ongoing hardware and technique developments to resolve these difficulties will be presented in this poster along with interesting effects of the ion source solenoid field polarity on the sputtering process.

收稿时间:2007-05-30
修稿时间:2007-04-20

ECR Sputter Feed Development at NSCL
D.Cole,G.Machicoane,L.Tobos,P.Zavodszky. ECR Sputter Feed Development at NSCL[J]. High Energy Physics and Nuclear Physics, 2007, 31(Z1): 239-239
Authors:D.Cole  G.Machicoane  L.Tobos  P.Zavodszky
Abstract:Production of metallic ion beams in support of the experimental program at the Coupled Cyclotron Facility at the NSCL required the development of ion sputtering feed of metallic molybdenum,nickel,uranium,and zirconium for use with the ARTEMIS ion source.The production of high intensity lower to medium charge state ions required high material consumption,posing sonle significant difficulties in reliable long term beam stability.Resultant and ongoing hardware and technique developments to resolve these difficulties will be presented in this poster along with interesting effects of the ion source solenoid field polarity on the sputtering process.
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