首页 | 本学科首页   官方微博 | 高级检索  
     

Schottky Barrier Height Inhomogeneity of Ti/n—GaAs Contact Studied by the I—V—T Technique
作者姓名:蒋玉龙 陆Fang 等
作者单位:[1]DepartmentofMicroelectronics,ASIC&SystemStateKeyLaboratory,FudanUniversity,Shanghai200433 [2]StateKeyLaboratoryofAppliedSurfacePhysics,FudanUniversity,Shanghai200433
摘    要:The current-voltage characteristics of Ti/n-GaAs Schottky diodes measured over a temperature range of 78-299K have been interpreted on the basis of thermionic emission across an inhomogeneous Schottky contact.The experiment shows that the apparent barrier height (φap) increases from 0.437eV at 78K to 0.698eV at room temperature.the plot of φap versus 1/T does not exhibit a simple linear relationship over the whole temperature range,indicating that the barrier height distribution is more complicated than the frequently observed single Gaussian distribution.A new multi-Gaussian distribution model is developed.Our experimental results can be explained by a double Gaussian distribution of the barrier heights.The weight,the mean barrier height,and the standard deviation of the two Gaussian functions are 0.00001 and 0.99999,0.721 and 0.696,0.069 and 0.012eV,respectively.

关 键 词:金属半导体 Schottky二极管 I-V-T技术
本文献已被 维普 等数据库收录!
设为首页 | 免责声明 | 关于勤云 | 加入收藏

Copyright©北京勤云科技发展有限公司  京ICP备09084417号