Surface patterned graft copolymerization of hydrophilic monomers onto hydrophobic polymer film upon UV irradiation

A random copolymer p(MMA/DMAB)] composed of methyl methacrylate (MMA) and 2,2‐dimethoxy‐1,2‐di(4‐methacryloyloxy)phenylethane‐1‐one (DMAB), which can simultaneously act as a photoradical initiator and crosslinkable monomer, was prepared by free radical random copolymerization. A hydrophobic film on quartz glass was prepared using p(MMA/DMAB) by a spin‐coating technique. Hydrophilic methacrylic acid (MA) and 2‐methacryloyloxyethyl phosphorylcholine (MPC) were graft‐copolymerized from the hydrophobic p(MMA/DMAB) film in water by photo‐cleavage of the DMAB unit. The graft copolymer of MA and MPC was characterized by infrared and X‐ray photoelectron spectroscopies and contact angle measurements. To confirm that MPC can be grafted onto the surface of the film selectively at only UV‐irradiated sites, photoinduced graft copolymerization of MPC using a photomask was performed to prepare a pMPC patterned p(MMA/DMAB) film. The film was stained using a rhodamine 6G dye that can absorb specifically to pMPC to confirm the pMPC pattern. The p(MMA/DMAB) film can be applied to various fields including photolithography and biomedical applications, because the film surface properties can be controlled using various vinyl monomers selectively on UV‐irradiated sites. © 2014 Wiley Periodicals, Inc. J. Polym. Sci., Part A: Polym. Chem. 2014 , 52, 2822–2829