X-ray study of growing wetting films |
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Authors: | P. Müller-Buschbaum M. Strzelczyk M. Tolan W. Press |
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Affiliation: | (1) Institut für Experimentalphysik, Christian-Albrechts-Universität zu Kiel, Leibnizstrasse 19, D-24098 Kiel, Germany |
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Abstract: | X-ray scattering experiments of liquid films on top of solid substrates were performed. With a short pulse disturbance, caused by a temperature difference between the substrate and the vapour in the X-ray cell, the wetting film thickness is reduced. Afterwards the time dependence of the growing film is monitored by X-ray reflectivity measurements in the region of total external reflection. We have examined CCl4- and CCl3Br-films on top of silicon wafers and CCl3Br on glass/gold and glass/silver substrates. The film thickness as function of time is explained by the Kolmogorov growth model. From the data we obtain rather long time constants and the dimensiond=2 of the growing process |
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Keywords: | 68.15 61.10 68.10 |
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