| 光刻技术及其应用的状况和未来发展 |
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| 引用本文： | 刘文辉. 光刻技术及其应用的状况和未来发展[J]. 电子工业专用设备, 2006, 36(3): 36-42 |
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| 作者姓名： | 刘文辉 |
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| 摘 要： | 光刻技术及其在产业中的开发应用一直是业界人们关注的焦点之一,概述了目前几种具有潜力的光刻机技术及其应用的状况,同时通过对相关光刻的技术性和经济性比较,简述了其未来的发展。
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| 关 键 词： | 光刻技术 纳米制造 光子光源 极小微粒源 特理接触 |
| 文章编号： | 1004-4507(2006)03-0036-07 |
The Status and Future of Lithography and It's Application |
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| Liu Wen-hui. The Status and Future of Lithography and It's Application[J]. Equipment for Electronic Products Marufacturing, 2006, 36(3): 36-42 |
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| Authors: | Liu Wen-hui |
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| Abstract: | Lithography and it's development has been one of focus in electronics industry. This paper recited the status of some potential lithography including it's applications. At the same time, the paper predicted the future of nanofabrication based on comparison of technology and operation cost. |
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| Keywords: | Lithography Nanofabrication Photons Particles Physical contact |
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