1-4丁炔二醇和乙二胺对离子液体电沉积Cu的影响(英文)

研究了1-4丁炔二醇和乙二胺作为添加剂对在离子液体1-甲基-3-甲基咪唑三氟甲磺酸盐中电沉积Cu的影响。紫外可见光吸收光谱结果表明,当采用1-4丁炔二醇作为添加剂时,1-4丁炔二醇吸附在工作电极表面且未与溶液中的Cu2+形成配合物。扫描电镜测试结果表明由于1-4丁炔二醇与离子液体的正离子的竞争吸附使得Cu的沉积电势发生正移并使镀层表面更加均匀平整。当采用乙二胺作为添加剂时,紫外可见光吸收光谱和循环伏安测试结果表明乙二胺与溶液中的Cu2+离子形成带有正电荷的络合离子使得Cu的沉积电势发生正移,扫描电镜和原子力显微镜测试结果表明得到了更加均匀的镀层。当同时加入1-4丁炔二醇和乙二胺时,Cu的沉积电势仍然发生正移并得到具有纳米粒径的镀层。

Effect of 2-Butyne-1,4-diol and Ethylene Diamine on Electrodeposition of Cu from Ionic Liquid

The effect of additives, 2-Butyne-1,4-diol (BDO) and ethylene diamine (EDA), was investigated on the electrodeposition of Cu from 1-hexyl-3-methylimidazolium trifluoromethanesulfonate (HMIM]OTF). The results of UV-Vis absorption spectra and Cyclic voltammograms indicate that the reduction potential of Cu shifts to the positive side with the addition of BDO without any changes in the coordination environment of Cu²⁺. The adsorption of BDO on surface of working electrode results in a change in morphology of the obtained deposit. In the presence of EDA, the coordination environment of Cu²⁺ is changed, suggesting the formation of a new complex by Cu²⁺ and EDA. The deposition potential shifts to the positive side with addition of EDA. Scanning electron microscope and atomic force microscope tests show that the surface morphology of the obtained deposit is flatter and more granular compared to that without EDA. When BDO and EDA are added into HMIM]OTF at the same time, the deposition potential still shifts positively and nano-sized grains are obtained.