电感耦合等离子体发射光谱法测定二氧化铀中痕量磷和硅元素

研究了电感偶合等离子体发射光谱法测定二氧化铀(UO2)中痕量磷和硅元素含量的方法。经过对HNO3,H2O等试剂的多级纯化,获得超低空白的高纯试剂。对样品溶解、待测杂质元素与铀基体分离等过程从机理方面进行了研究。在分离铀基体与硅元素时用磷酸三丁酯(TBP)作萃取剂,二甲苯作为稀释剂;在分离铀基体与磷元素时用三辛胺(TOA)作萃取剂,二甲苯作稀释剂。二氧化铀中磷、硅元素检出限分别为0.012,0.078μg/g,加标回收率分别为98%,96%,相对标准偏差小于4%(n=6)。该方法重现性好、检出限低,满足生产和科研检测要求。

Determination of Trace Phosphorus and Silicon Element in UO2 by ICP-AES

The method for determination of trace phosphorus and silicon in UO2 by ICP-AES was studied. The high purity grade HNO3 and H2O were prepared to reduce the background of the whole analytical process by multilevel purification. Sample solution, separation of impurities and matrix were studied in the mechanism aspect. TBP was taken as extractant and dimethylbenzene as dillution agent for seperating uranium and silicon. TOA was taken as extractan and dimethylbenzene as dillution agent for seperating uranium and phosphorus. The detection limit of trace phosphorus and silicon elements in UO2 were 0.012,0.078μg/g respectively. The recovery of the method was 98%for phosphorus and 96%for silicon, the relative standard deviation was less than 4%（n=6）. The method has good sensitivity, low detection limit, and it can meet detection demand.