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Local surface cleaning and cluster assembly using contact mode atomic force microscopy
Authors:D. -Q. Yang  E. Sacher  
Affiliation:

Groupe des Couches Minces and Département de Génie Physique, École Polytechnique, C.P. 6079, Succursale Centre-Ville, Montréal, Que., Canada H3C 3A7

Abstract:Conventional contact mode atomic force microscopy (AFM) has been used for local surface cleaning and cluster alignment. By using the AFM tip to sweep and push in contact mode, we have demonstrated that Cu clusters, prepared by vacuum evaporation onto Dow Cyclotene 3022 polymer and subsequent exposure to atmosphere, can easily be moved by the AFM tip, and assembled at the outer edge of the scanned region to form a line of clusters. We have found that the force applied by the tip plays an important role in the ease of cluster motion. Cyclotene surface treatment that enhances cluster adhesion hinders this ability, and may be used as a method of nanofabrication.
Keywords:Copper nanoclusters   AFM   Cluster manipulation   Dow Cyclotene polymer   Local surface cleaning
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