首页 | 本学科首页   官方微博 | 高级检索  
     检索      


Ab initio calculation of the adhesion and ideal shear strength of planar diamond interfaces with different atomic structure and hydrogen coverage
Authors:Zilibotti G  Righi M C
Institution:Dipartimento di Fisica, Universita? di Modena e Reggio Emilia, Italy.
Abstract:We propose a method to calculate the ideal shear strength τ of two surfaces in contact by ab initio calculations. This quantity and the work of adhesion γ are the interfacial parameters usually derived from tip-based friction force measurements. We consider diamond interfaces and quantitatively evaluate the effects of surface orientation and passivation. We find that in the case of fully passivated interfaces, γ is not affected by the orientation and the alignment of the surfaces in contact. On the contrary, τ does show a dependence on the atomic-scale roughness of the interface. The surface termination has a major impact on the tribological properties of diamond. The presence of dangling bonds, even at concentrations low enough to prevent the formation of interfacial C-C bonds, causes an increase in the resistance to sliding by 2 orders of magnitude with respect to the fully hydrogenated case. We discuss our findings in relation to experimental observations.
Keywords:
本文献已被 PubMed 等数据库收录!
设为首页 | 免责声明 | 关于勤云 | 加入收藏

Copyright©北京勤云科技发展有限公司  京ICP备09084417号