Structural Analysis of the Layered Compounds Cu x TiS2

Abstract

A structural analysis of single crystals of the layered compounds Cu _x TiS₂ (x=0. 0.21 and 0.38), which were prepared by the iodine transport and the electrochemical methods, has been performed by X-ray diffraction. The displacement parameters of Ti and S atoms along the c axis are larger than those along the a axis. It is understood that the intra-layer bonding between Ti-Ti and S-S atoms is stronger than the inter-layer bonding between Ti-and S-layers. Both distances between Ti-and S-layers and between Cu-and S-layers are enlarged without changing the structure of the mother phase after intercalating Cu atoms.