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Atmospheric Pressure Plasma Deposition of Polyfuran
Authors:Aysegul Gok  Lutfi Oksuz
Affiliation:1. Faculty of Arts and Science, Department of Chemistry , Suleyman Demirel University , Isparta, Turkey aysegul@fef.sdu.edu.tr;3. Faculty of Arts and Science, Department of Physics , Suleyman Demirel University , Isparta, Turkey
Abstract:

The atmospheric pressure radiofrequency (RF) plasma polymerization of furan was carried out with the objective of synthesizing polyfuran thin film. The structure, compositions and morphology of the plasma deposited polyfuran film were investigated by Fourier transform infrared (FTIR), atomic force microscopy (AFM), ultraviolet‐visible absorption spectroscopy (UV‐vis) and thermogravimetric analysis (TGA). The formation of polyfuran was confirmed using FTIR and UV‐visible analysis. The properties of plasma‐deposited polyfuran were compared with those of chemically synthesized polyfuran. Although the plasma deposited thin film polyfuran shows lower thermal stability than that of chemically synthesized polyfuran. It has better solubility in CHCl3, also. Thin uniform polyfuran films are obtained in plasma assisted polyfuran deposition, while particles are obtained in chemical polyfuran polymerization.
Keywords:polyfuran  atmospheric plasma deposition  thin films
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