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Patterning Flexible Substrates Using Surface Relief Structures in Azobenzene Functionalized Polymer Films |
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| Authors: | Suizhou Yang Ke Yang Aloke Jain Ramaswamy Nagarajan Jayant Kumar |
| Affiliation: | 1. Center for Advanced Materials , University of Massachusetts , Lowell, MA, 01854 Phone: 978-934-3695 Fax: 978-934-3695;2. Center for Advanced Materials , University of Massachusetts , Lowell, MA, 01854 Phone: 978-934-3707 Fax: 978-934-3707;3. Department of Plastics Engineering , University of Massachusetts , Lowell, MA, 01854 Phone: 978-934-3454 Fax: 978-934-3454;4. Department of Physics and Applied Physics , University of Massachusetts , Lowell, MA, 01854 Phone: 978-934-3687 Fax: 978-934-3687 |
| Abstract: | A novel method for maskless micro-patterning of polymeric substrates is presented. First, an azobenzene functionalized polymer film is spin-coated on a Poly (ethylene terephthalate) (PET) sheet. Then surface relief structures are optically inscribed on the polymer film by interference of laser beams. The patterned azobenzene functionalized film is then etched in the plasma chamber such that the gratings are transferred to the PET substrate. Finally, any remaining azobenzene functionalized polymer is dissolved away using an appropriate solvent. This method of patterning can be broadly applied to a variety of flexible/polymeric substrates and the resolution is not limited by the substrate thermo-mechanical properties. |
| Keywords: | Maskless micro-patterning of plastics azobenzene functionalized polymers surface relief structures optically induced grating etching |