Sputtering of zinc sulfide phosphors in excitation of radical-recombination luminescence by atomic hydrogen

Treatment of zinc sulfide phosphors in atomic hydrogen not only produces radical-recombination luminescence (RRL) but also sputtering of the phosphor. The sputtering rate has been estimated for FKP-03k powder phosphor at various temperatures. The atomic hydrogen produces defects of etch-pit type on the surface of a single crystal. The long-term response of the RRL has been recorded for the FKP-03k phosphor and it is ascribed to the sputtering.Translated from Izvestiya Vysshikh Uchebnykh Zavedenii, Fizika, No. 3, pp. 107–110, March, 1975.