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Correlation between photoluminescence, optical and structural properties of amorphous nitrogen-rich carbon nitride films |
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| Authors: | MF Plass C Popov B Ivanov S Mändl M Jelinek LM Zambov W Kulisch |
| Institution: | University of Kassel, Institute of Technical Physics, Heinrich Plett Strasse 40, 34109 Kassel, Germany, DE University of Chemical Technology and Metallurgy, Dept. of Semiconductors, Kliment Ohridski Blvd. 8, 1756 Sofia, Bulgaria, BG University of Augsburg, Institute of Experimental Physics IV, Universit?tstrasse 1, 86159 Augsburg, Germany, DE Czech Academy of Sciences, Institute of Physics, Na Slovance 2, 18221 Prague 8, Czech Republic, CZ |
| Abstract: | Amorphous nitrogen-rich carbon nitride (CNx) films have been prepared by inductively coupled plasma chemical vapour deposition (ICP-CVD) utilizing transport reactions from a solid carbon source. The nitrogen atomic fraction N/(C+N) is about 1 or even higher as detected by various surface and bulk sensitive methods. An investigation of the chemical bonding structure showed that the films are composed of >C=N units with a small fraction of C≡N groups. Based on these findings, several structural units derived from cis- and trans-conjugated carbon–nitrogen chains are proposed. The optical properties of the CNx films were studied by transmission spectroscopy and spectral ellipsometry; the optical Tauc gap was determined to 2.1±0.05 eV. The photoluminescence characteristics were measured at three different excitation wavelengths (476, 488 and 515 nm) and revealed two individual contributions. These data are interpreted in terms of the different structural units comprising the nitrogen-rich CNx films. Received: 14 July 2000 / Accepted:17 July 2000 / Published online: 22 November 2000 |
| Keywords: | PACS: 68 55 -a 78 20 -e 78 55 -m |
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