| 用椭偏光谱法测量很薄固体膜的光性 |
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| 引用本文： | 黄炳忠,陈土培.用椭偏光谱法测量很薄固体膜的光性[J].分析测试学报,1989(2). |
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| 作者姓名： | 黄炳忠 陈土培 |
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| 作者单位： | 中山大学物理系
(黄炳忠)，中山大学物理系(陈土培) |
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| 摘 要： | 本文讨论了利用棉偏光谱法测量很薄固体膜的光性的原理和方法,包括椭偏计算模型的建立、模型的合适性等问题,考察了环境介质-薄膜-衬底三根系统和环境介质-薄膜-界面过渡层-衬底四相系统,并引入了一种简化椭偏计算的方法。此外,本文也给出了两个研究实例,包括Si衬底上的Pt膜和PtSi膜。
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| 关 键 词： | 光学性质 椭偏光谱法 薄膜 界面过渡层 |
Determination of Optical Properties of Very Thin Films by Spectroscopic Ellipsometry |
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| Huang Bingzhou,chen Tupel Physics.Determination of Optical Properties of Very Thin Films by Spectroscopic Ellipsometry[J].Journal of Instrumental Analysis,1989(2). |
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| Authors: | Huang Bingzhou chen Tupel Physics |
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| Institution: | Huang Bingzhou,chen Tupel Physics Department of Zhongshan University,Guangzhou |
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| Abstract: | In this paper, the method for Spectroscopic ellipsometric determination of very thinsolid films including establishment of model for ellipsometric calculation and its feasibility,were described.And systems of ambientthin film-substrate,and ambient-thin film-interface layer-substrate were investigated.A simplified ellipsometric calculation method for two examplesof Pt film and PtSi film on Si substrates were discussed. |
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| Keywords: | Optical properties spectroscopic ellipsometrs thin film interface layer |
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